Advanced Process Control to Minimize Disturbance in Gas Processing Facility (GPF)

Department of Engineering Physics, Institut Teknologi Sepuluh Nopember, Sukolilo, Jl. Teknik Kimia, Sukolio, Surabaya 60111, Indonesia

^* Corresponding author: safirafirdaus.f49@gmail.com

Abstract

For the gas treatment process, the process that occurs is separating the gas from the components of H₂S, CO₂, and H₂O. The separation of gases from these components uses the aid of Amine fluid and TEG fluid. The unit that important in this process are Amine and TEG Contactor. To be able to separate the three components from the gas, the mass flow rate of Amine and TEG must be controlled so that the processing can work optimally. In reality in the field, the input of this process from the well is not always steady. So, this condition becomes a disturbance from the control process. The solution to minimize the disturbance of process with Advanced Process Control (APC). Therefore, this research will design APC on Amine and TEG Contactor to improve the stability of the mass flow response of Amine and TEG. In designing APC, the plant model is required first. Plant modelling obtained with software HYSYS and validated with MATLAB. The result shows the RMSE value below 5 %. The result proved to be able to make the process more stable from before design proven by slurries settling time, steadystate errors and maximum overshoot.