| Issue |
E3S Web Conf.
Volume 625, 2025
5th International Conference on Environment Resources and Energy Engineering (ICEREE 2025)
|
|
|---|---|---|
| Article Number | 03006 | |
| Number of page(s) | 3 | |
| Section | Resource Management and Ecosystem Regulation | |
| DOI | https://doi.org/10.1051/e3sconf/202562503006 | |
| Published online | 17 April 2025 | |
Design and preparation of 222nm deep ultraviolet thin films
1 Changchun College of Electronic Technology, Changchun, China
2 Jilin Engineering Normal University, Changchun, China
a2993516002@qq.com; b 483302743@qq.com; c 3368575734@qq.com;
d1391462188@qq.com; e2185078704@qq.com; f2983192258@qq.com; g*Email: 48580914@qq.com
This paper proposes a design scheme for a deep ultraviolet anti-reflective film, with a substrate material of JGS1, and high and low refractive index materials of Al2O3 and AlF3, respectively. The Essential Macleod optical thin film design software was used to simulate the 222nm deep ultraviolet anti-reflective film. The simulation results show a transmission rate of 99.99%at 222nm. However, due to the presence of scattering and absorption, the actual experimental transmission rate is 99.2%. Although the actual transmission rate is 0.79%lower than the theoretical value, it still meets the application requirements.
© The Authors, published by EDP Sciences, 2025
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