E3S Web Conf.
Volume 22, 2017International Conference on Advances in Energy Systems and Environmental Engineering (ASEE17)
|Number of page(s)||7|
|Published online||07 November 2017|
Influence of sputtering deposition parameters on electrical and optical properties of aluminium-doped zinc oxide thin films for photovoltaic applications
Lublin University of Technology, Faculty of Environmental Engineering, Institute of Renewable Energy Engineering, ul. Nadbystrzycka 40B, 20–618 Lublin, Poland
2 Institut des Nanotechnologies de Lyon –INL, UMR CNRS 5270 CNRS, Université de Lyon, INSA de Lyon, F–69621 Villeurbanne, France
* Corresponding author: firstname.lastname@example.org
Transparent Conductive Oxides (TCOs) characterized by high visible transmittance and low electrical resistivity play an important role in photovoltaic technology. Aluminum doped zinc oxide (AZO) is one of the TCOs that can find its application in thin film solar cells (CIGS or CdTe PV technology) as well as in other microelectronic applications. In this paper some optical and electrical properties of ZnO:Al thin films deposited by RF magnetron sputtering method have been investigated. AZO layers have been deposited on the soda lime glass substrates with use of variable technological parameters such as pressure in the deposition chamber, power applied and temperature during the process. The composition of AZO films has been investigated by EDS method. Thickness and refraction index of the deposited layers in dependence on certain technological parameters of sputtering process have been determined by spectroscopic ellipsometry. The measurements of transmittance and sheet resistance were also performed.
© The Authors, published by EDP Sciences, 2017
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (http://creativecommons.org/licenses/by/4.0/).
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