E3S Web of Conferences

Study of the profiles of the distribution of atoms of the contacting material over the depth of pure and ion-doped silicon

S.B. Donaev, G.M. Shirinov, S. Ergasheva, A.M. Rakhimov, Shenghao Wang and A.A. Abduvayitov

E3S Web Conf., 383 (2023) 04041

Published online: 24 April 2023

DOI: 10.1051/e3sconf/202338304041

S.B. Donaev

G.M. Shirinov

S. Ergasheva

A.M. Rakhimov

Shenghao Wang

A.A. Abduvayitov

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)