E3S Web of Conferences

Optimum technological modes of ion implantation and subsequent annealing for formation of thin nanosized silicide films

Ilkhom Bekpulatov, Ilkhom Turapov, Sevara Abraeva and Jakhongir Normuminov

E3S Web Conf., 264 (2021) 05037

Published online: 02 June 2021

DOI: 10.1051/e3sconf/202126405037

Ilkhom Bekpulatov

Ilkhom Turapov

Sevara Abraeva

Jakhongir Normuminov

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