Issue |
E3S Web Conf.
Volume 17, 2017
9th Conference on Interdisciplinary Problems in Environmental Protection and Engineering EKO-DOK 2017
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Article Number | 00047 | |
Number of page(s) | 8 | |
DOI | https://doi.org/10.1051/e3sconf/20171700047 | |
Published online | 24 May 2017 |
The role of pH in the decomposition of organic micropollutants during the heterogeneous photocatalysis process
Silesian University of Technology, Faculty of Energy and Environmental Engineering, Konarskiego 18a, 44-100 Gliwice, Poland
* Corresponding author: edyta.kudlek@polsl.pl
The study investigated that the change in the pH ranged from 5 to 7 affects the adsorption degree of selected organic micropollutants such as: polycyclic aromatic hydrocarbons (anthracene, benzo[a]pyrene), pharmaceutical compounds (diclofenac) and industrial additives (octylphenol and pentachlorophenol) on the photocatalyst surface (100 mg TiO2/dm3). For example, in suspension of pH 5 a 12% reduction in the concentration of octylphenol was noted, while in the suspension of pH 7 the concentration of this compound was reduced by 64%. In the case of anthracene an inverse relationship was observed. The concentration of this micropollutant decreased by 94% for pH 5 and only by 61% for pH 7 suspension. With the commencement of UV irradiation of reaction mixtures a gradual increase in the concentration of micropollutants reduction in aqueous solutions was observed. This indicates the decomposition of compounds as a result of their reaction with highly reactive OH• radicals or other reactive oxygen species generated during the process. For reaction mixtures of pH 7, already in the first 15 minutes, higher degrees of removal of micropollutants ware observed compared to suspension of pH 6. The obtained micropollutants removal degrees exceeded 91% for diclofenac, octylphenol, pentachlorophenol and amounted to 100% for anthracene and benzo(a)pyrene.
© The Authors, published by EDP Sciences, 2017
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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