E3S Web Conf.
Volume 194, 20202020 5th International Conference on Advances in Energy and Environment Research (ICAEER 2020)
|Number of page(s)||6|
|Section||Energy Engineering and Energy Development and Utilization|
|Published online||15 October 2020|
The influence of microstructure characteristics on electrical properties in ITO thin film
1 Nuclear and Radiation Safety Centre MEE, Beijing 102400, China
2 NICE Solar Energy Corporation Ltd., Beijing 102211, China
* Corresponding author: email@example.com
ITO thin films were deposited on sapphire substrates under different deposition parameters via ion-assistant electron beam evaporation method. Microstructure characteristics such as crystalline structure and surface morphology of as-deposited ITO thin films were studied by using X-ray diffraction spectroscopy, transmission electron microscopy and field emission scanning electron microscopy, as well as the index of sheet resistance, carrier concentration, carrier mobility and transmission in visible spectrum were tested by means of Hall effect tester and UV-VIS-NIR spectrophotometer, respectively. The influence and impact mechanism of microstructure characteristic on electrical properties of as-deposited ITO thin films were investigated and analyzed in detail.
© The Authors, published by EDP Sciences, 2020
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