| Issue |
E3S Web Conf.
Volume 394, 2023
6th International Symposium on Resource Exploration and Environmental Science (REES 2023)
|
|
|---|---|---|
| Article Number | 01031 | |
| Number of page(s) | 8 | |
| DOI | https://doi.org/10.1051/e3sconf/202339401031 | |
| Published online | 02 June 2023 | |
Implementation Principles of Optimal Control Technology for the Reduction of Greenhouse Gases in Semiconductor Industry
1 EUNCET Business School, Universitat Politecnica de Catalunya, Barecelona, 08034, Spain
2 Facility Engineering and Environment Department, AFPD Pte Ltd, Singapore 528798, Singapore
3 Sustainability Design, China Academy of Art, Hangzhou, 310002, China
* Corresponding author: yuanzhe001@e.ntu.edu.sg
Climate change is occurring at a much faster rate than in the past and it cannot be explained solely by natural causes. Humans, specifically the greenhouse gases (GHG) emissions produced by human activity, are the primary cause of the earth’s rapidly changing climate today. As one of the most GHG emission industries, semiconductor, at present, there is no clear guideline for the implementation of significant reduction method for many fluorinated compounds (FCs), N2O and NF3 greenhouse gases in the domestic and overseas semiconductor industry. Therefore, this report, implementation principles of optimal control technology for the GHG emissions have been proposed based on the Intergovernmental Panel on Climate Change (IPCC) and old reduction method. This reduction method is suitable for the installation of efficient exhaust gas destruction equipment for the removal of FCs and N2O from Etching, Thin Film, including chemical/physical vapour deposition, and Diffusion processes in the semiconductor industry.
Key words: Greenhouse Gas (GHG) / GHG Emission Reduction / Methodology / Semiconductor Industry / Gas Abatement System
© The Authors, published by EDP Sciences, 2023
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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